Product characteristics
Nano hafnium nitride(HfN) is prepared by aerosol ablation and has high purity, small particle size, uniform distribution, large specific surface area, high surface activity, gray powder, and cubic crystal structure. Microhardness 16GPa. It is quite stable, but it is easily corroded by Aqua regia, concentrated sulfuric acid, and fluoric acid. It is produced by the direct reaction of niobium and nitrogen at 900 ℃, or by the reaction of niobium halides with ammonia or a mixture of nitrogen and hydrogen. It is an important component of the important refractory compound <UNK> alloy.
Product parameters
Products hafnium nitride(HfN)
Product Model ZH-HfN-01
Average particle size 100 nm
Product purity 99.5 %
Specific surface area 26.334 m2/g
Theoretical density 13.200 g/cm3
Pine density 5.846 g/cm3
Melting point 2100 ℃
Boiling point 5200 ℃
Crystalline near spherical
Exterior grayish black powder
Distributed gas phase method, easy to disperse liquid and polymer materials
Note that the size of the product granularity can be customized processing, the co***ny can provide surface treatment technology, dispersant, application technology guidance.
Product application
1 Nanohafnium nitride has excellent mechanical, electrical, optical, high temperature and corrosion resistance characteristics and has very important applications in mechanical manufacturing and Microelectronics.
2 Nanohafnium nitride can be widely used in many fields such as semiconductors, photoelectricity and mechanical processes;
Due to the integration of a variety of excellent mechanical, thermal, optical, and corrosion-resistant wear characteristics at the same time, the 3 nanometer niobium nitride film is expected to become an efficient optical window penetration protection coating material that can be applied to aero***ce. Key optical devices.
Packaging storage
This product is an inert gas plastic bag packaging, sealed and preserved in a dry, cool environment, should not be exposed to air, anti-moisture oxi |
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